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Volume 6
Research & Reviews: Journal of Material Sciences
Advanced Materials 2018
September 19-21, 2018
September 19-21, 2018 Tokyo, Japan
22
nd
International Conference on
Advanced Materials and Nanotechnology
Sheng-Chuan Hsu et al., Shi-Ru et al., Res. Rev. J Mat. Sci. 2018, Volume 6
DOI: 10.4172/2321-6212-C4-024
Improved electrochromic performance of tungsten-oxide electrode film deposited by vacuum cathodic
arc plasma
Sheng-Chuan Hsu, Po-Wen Chen, Meng-Hsin Chen, Jin-Yu Wu and Der-Jun Jan
Institute of Nuclear Energy Research, Taiwan
T
his paper reports on fabrication of tungsten-oxide (WO3) electrode films on a transparent conducting coated glass
substrate by cathodic arc plasma (CAP) technique. The influences of various oxygen deliveries on structural, optical and
electrochemical properties of WO3 electrode films were investigated. X-Ray Diffraction (XRD) analysis indicated that the
crystal structures of WO3 electrode film were amorphous which porous and columnar form exhibited high-rate ion injection/
extraction into/out of WO3 electrode films. We have demonstrated better Electrochromic Device (ECD) performance based on
prepared WO3 electrode film with O2/Ar=5, that enhanced electrochromic properties in terms of shorter coloration/bleaching
response times and better cycling durability. The impressive colored/bleached cycle, good ion diffusion coefficient (4.52×10
-9
cm²/s), high optical transmittance difference (~74%), high deposition rate (~15 nm/min) and fast coloration and bleaching
times (7 s and 6 s) are suggesting that columnar arrays of WO3 electrode film deposited by the CAP technique is the promising
smart window for potential electrochromic application.
Biography
Sheng-Chuan Hsu has completed his Master’s degree from National Tsing Hua University and presently he is working in Division of Physics, Institute of Nuclear
Energy Research. He is interested in optical materials.
powen@iner.gov.tw