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Research & Reviews: Journal of Material Sciences | ISSN: 2321-6212 | Volulme 6

November 07-08, 2018 | Atlanta, USA

Materials Science and Engineering

15

th

International Conference and Exhibition on

Applied Crystallography

3

rd

International Conference on

&

Influence of patterned substrates on miniaturization of surface patterns in soft elastic films

Jayati Sarkar

Indian Institute of Technology, India

T

he advantages of diminutive-size surface-patterns have been harnessed by various industries, such as semiconductor, integrated

circuits, nano-devices, nano-sensors, optoelectronics etc. Patterning the soft thin elastic films through self-organization is found

to be a cheaper alternative route for fabricating meso/nano length scales at such soft interfaces compared to conventional lithographic

techniques. Self-organization involves surface reorganization of a polymeric film resting on a substrate, due to the application of a

force field created by an external contactor. The film reorganizes itself to attain the minimum energy state that leads to the surface-

patterning. For elastic thin films cast on smooth substrates, the instability length scales between the contact zones have been reported

to be ~2.96*h (h being the mean thickness of the elastic film). Linear stability analysis and numerical simulation studies on soft elastic

thin films show that much smaller pattern length scales can be obtained for sinusoidal-patterned-substrates when used in lieu of flat

substrates. Inspired by the theoretical work, we have performed soft film adhesive experiments on three patterned substrates created

from naturally occurring water lily leaves, low-cost commercially available compact disks and EBM created cubic patterns. The

morphological surface patterns of columns, labyrinths and cavities formed at different stages of the adhesion-debonding cycle in these

experiments do indeed reveal minuscule length scale formation that is much less than 2.96*h. Thus, the present work experimentally

and through numerical simulations demonstrates a simple and uncomplicated method to create miniaturized patterns, which have

extensive applications in fabricating lab-on-chip devices, self-cleaning materials, scaffolds for tissue engineering etc.

jayati@chemical.iitd.ac.in

Res. Rev. J Mat. Sci. 2018, Volume 6

DOI: 10.4172/2321-6212-C8-036