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conferenceseries
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Volume 5, Issue 6 (Suppl)
J Mat. Sci.
ISSN: 2321-6212
Advanced Materials 2017
October 26-28, 2017
OCTOBER 26-28, 2017 OSAKA, JAPAN
13
TH
INTERNATIONAL CONFERENCE ON
Advanced Materials and Nanotechnology
Perpendicular orientation of lamella-forming block copolymer thin film by controlling interfacial
interaction with substrate
Jisoo Ha
Yonsei University, Republic of Korea
P
erpendicular orientation of Block Copolymer (BCP) micro-domains has been received attention for the next-generation
lithography and nanotechnology. Many researchers have investigated various techniques to establish perpendicular
nanostructures by controlling the interfacial interaction between BCP film and substrate. A surface modification method using
random copolymer brush is extensively studied due to its simplicity and effectiveness. End-functionalized random copolymer
brush chains attach to the substrate by condensation reaction, which forms covalent bond. In this study, we have controlled
the interaction between substrate and the block copolymer by coating the Si wafer surface with random copolymer. On these
modified substrates, polystyrene-b-poly(methyl methacrylate) (PS-b-PMMA) thin film was spin-coated with fine-tuned
thickness and thermally-annealed to form its equilibrium structure. We observed the thickness window of vertical orientation
and assessed the appropriate parametric extent of surface energy modification. The experimental result indicates the optimal
extent of surface modification in order to obtain perpendicular orientation of BCP for nanopattern fabrication.
Biography
Jisoo Ha is currently a Master’s degree student of Chemical Engineering at Yonsei University, Republic of Korea.
eternity5166@gmail.comJisoo Ha, J Mat. Sci. 2017, 5:6
DOI: 10.4172/2321-6212-C1-009